Drawing device - Company Ranking(9 companies in total)
Last Updated: Aggregation Period:Sep 24, 2025〜Oct 21, 2025
This ranking is based on the number of page views on our site.
Display Company Information
| Company Name | Featured Products | ||
|---|---|---|---|
| Product Image, Product Name, Price Range | overview | Application/Performance example | |
Laser drawing device "DWL 2000 GS" series
More than 100million yen |
【Device Performance】 *When using binary drawing and selecting Write Mode 1 ■ Minimum Drawing Size [μm]: 0.5 ■ Minimum L&S [HP, μm]: 0.7 ... | 【Applications】 ■ 2.5D grayscale exposure for thick film resist (micro lenses, Fresnel lenses, DOE, holographic printing, security applicatio... | |
Laser Direct Writing Device "DWL 66+"
More than 100million yen |
【Example of Drawing Mode】 ■Drawing Mode: HR (High Resolution Mode 0.3um) ■Minimum Address Grid (nm): 5 ■Minimum Drawing Size (μm): 0.3 ■Edge... | 【Applications】 ■ Small lot mask creation ■ Maskless exposure, laser direct writing, laser direct drawing, 2.5D grayscale exposure ■ Patterni... | |
High-speed laser drawing device "VPG⁺ Series"
More than 100million yen |
【Drawing Performance】 ■Minimum Drawing Size [μm]: 0.75 ■Edge Roughness [3σ, nm]: 40 ■CD Uniformity [3σ, nm]: 65 ■Overlay Accuracy [3σ,... | 【Applications】 ■ Mask creation and patterning on wafers, etc. ■ Maskless exposure, direct writing, direct drawing ■ Patterning for semicondu... | |
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- Featured Products
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Laser drawing device "DWL 2000 GS" series
- overview
- 【Device Performance】 *When using binary drawing and selecting Write Mode 1 ■ Minimum Drawing Size [μm]: 0.5 ■ Minimum L&S [HP, μm]: 0.7 ...
- Application/Performance example
- 【Applications】 ■ 2.5D grayscale exposure for thick film resist (micro lenses, Fresnel lenses, DOE, holographic printing, security applicatio...
Laser Direct Writing Device "DWL 66+"
- overview
- 【Example of Drawing Mode】 ■Drawing Mode: HR (High Resolution Mode 0.3um) ■Minimum Address Grid (nm): 5 ■Minimum Drawing Size (μm): 0.3 ■Edge...
- Application/Performance example
- 【Applications】 ■ Small lot mask creation ■ Maskless exposure, laser direct writing, laser direct drawing, 2.5D grayscale exposure ■ Patterni...
High-speed laser drawing device "VPG⁺ Series"
- overview
- 【Drawing Performance】 ■Minimum Drawing Size [μm]: 0.75 ■Edge Roughness [3σ, nm]: 40 ■CD Uniformity [3σ, nm]: 65 ■Overlay Accuracy [3σ,...
- Application/Performance example
- 【Applications】 ■ Mask creation and patterning on wafers, etc. ■ Maskless exposure, direct writing, direct drawing ■ Patterning for semicondu...
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